摘要
本文报道了对反应磁控溅射技术沉积的ＩＴＯ透明导电膜进行Ｘ射线衍射结构分析的结果。
Abstract The Study of X-ray diffraction analysis of ITO transparent conductive films prepared by magnetron reactive sputtering was reported in this paper. The relationship between different crystalline structures and preparing conditions of ITO films were described in details.
出处
《电子器件》
CAS
1996年第2期77-84,共8页
Chinese Journal of Electron Devices
